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Tungsten Target

Short Description:

Product Name: Tungsten(W)sputtering target

Grade: W1

Available Purity(%): 99.5%,99.8%,99.9%,99.95%,99.99%

Shape: Plate, round, rotary, pipe/tube

Specification: As customers demands

Standard: ASTM B760-07,GB/T 3875-06

Density: ≥19.3g/cm3

Melting point: 3410°C

Atomic volume: 9.53 cm3/mol

Temperature coefficient of resistance: 0.00482 I/℃

Product Detail

Product Tags

Product parameters

Product Name Tungsten(W)sputtering target
Grade W1
Available Purity(%) 99.5%,99.8%,99.9%,99.95%,99.99%
Shape: Plate, round, rotary, pipe/tube
Specification As customers demands
Standard ASTM B760-07,GB/T 3875-06
Density ≥19.3g/cm3
Melting point 3410°C
Atomic volume 9.53 cm3/mol
Temperature coefficient of resistance 0.00482 I/℃
Sublimation heat 847.8 kJ/mol(25℃)
Latent heat of melting 40.13±6.67kJ/mol
State Planar tungsten target,Rotating tungsten target,Round tungsten target
surface state Polish or alkali wash
Workmanship Tungsten billet (raw material)- Test- Hot rolling-Leveling and annealing-Alkali wash-Polish-Test-Packing

The sprayed and sintered tungsten target has the characteristics of 99% density or higher, the average transparent texture diameter is 100um or less, the oxygen content is 20ppm or less, and the deflection force is about 500Mpa; it improves the production of unprocessed metal powder To improve the sintering ability, the cost of the tungsten target can be stabilized at a low price. The sintered tungsten target has a high density, has a high-level transparent frame that cannot be achieved by the traditional pressing and sintering method, and significantly improves the deflection angle, so that the particulate matter is significantly reduced.


(1)  Smooth surface without pore,scratch and other imperfection 

(2)  Grinding or lathing edge, no cutting marks

(3) Unbeatable lerel of material purity 

(4) High ductility

(5) Homogeneous micro trucalture

(6) Laser marking for your special Item with name, brand, purity size and so on 

(7) Every pcs of sputtering targets from the powder materials item&number, mixing workers,outgas and HIP time,machining person and packing details are all made ourselves.

All of those step can promise you once a new sputtering target or method is created , it could be copied and kept to support a stabel quality products.

Other dvantage

High quality materials

(1) 100 % density = 19.35 g/cm³

(2) Dimensional stability

(3) Enhanced mechanical properties

(4) Uniform grain size distribution

(5) Small grain sizes


Tungsten target material is mainly used in aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum and other fields.

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